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		<secondarykey>INPE-13543-PRE/8756</secondarykey>
		<issn>0004-640X</issn>
		<citationkey>SpassovBarrUedaGuer:1998:CoHiPu</citationkey>
		<title>A compact high-voltage pulse generator for plasma applications</title>
		<project>Implantação Iônica por Imersão em Plasma (IIIP)</project>
		<year>1998</year>
		<secondarytype>PRE PI</secondarytype>
		<numberoffiles>1</numberoffiles>
		<size>152 KiB</size>
		<author>Spassov, V. A.,</author>
		<author>Barroso, Joaquim José,</author>
		<author>Ueda,  Mário,</author>
		<author>Guerguiev, L.,</author>
		<resumeid></resumeid>
		<resumeid></resumeid>
		<resumeid>8JMKD3MGP5W/3C9JHSB</resumeid>
		<group></group>
		<group>LAP-INPE-MCT-BR</group>
		<group>LAP-INPE-MCT-BR</group>
		<affiliation>Sofia University. Faculty of Physics</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais. Laboratório Associado de Plasmas, (INPE. LAP)</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Plasmas, (INPE. LAP)</affiliation>
		<affiliation>Wayne State University</affiliation>
		<journal>Astrophysics and Space Science</journal>
		<volume>256</volume>
		<number>1-2</number>
		<pages>533-538</pages>
		<transferableflag>1</transferableflag>
		<contenttype>External Contribution</contenttype>
		<keywords>PLASMA, Pulses, High voltages, Gyrotron, Plasma imersion ion implantation, PLASMA, Pulso, Alta voltagem, Girotron, Implantação iônica por imersão de plasma.</keywords>
		<abstract>The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 H and C = 2 5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 s pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with sine-wave, constant current source, and a 60 kV, 15 mA switching power supply..</abstract>
		<area>FISPLASMA</area>
		<language>en</language>
		<targetfile>36.pdf</targetfile>
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